Electron beam irradiation for the formation of thick Ag film on Ag3PO4

Abstract

This study demonstrates that the electron beam irradiation of materials, typically used in characterizationmeasurements, could be employed for advanced fabrication, modification, and functionalization ofcomposites. We developed irradiation equipment using an electron beam irradiation source to beapplied in materials modification. Using this equipment, the formation of a thick Agfilm on the Ag3PO4semiconductor is carried out by electron beam irradiation for thefirst time. This is confirmed by variousexperimental techniques (X-ray diffraction,field-emission scanning electron microscopy, Ramanspectroscopy, and X-ray photoelectron spectroscopy) andab initiomolecular dynamics simulations. Ourcalculations demonstrate that, at the earlier stages, metallic Ag growth is initiated preferentially at the(110) surface, with the reduction of surface Ag cations forming metallic Ag clusters. As the (100) and (111)surfaces have smaller numbers of exposed Ag cations, the reductions on these surfaces are slower andare accompanied by the formation of O2molecules.